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Novacise Ultra-high Filtration Retention Filter
Ultra-high precision and high flow rates, and the high surface energy features to support rapid operation

Novacise? Series are used to dilute acids, bases and other process chemicals as a cost-effective alternative for wet etch and clean applications.

The asymmetric PES membrane provides significant characteristics including high flow rates, high dirt holding capacity, and longer filter lifetime. In addition, the membrane structure reduces bubbles formation during flow.

Cobetter Novacise Filters have efficient particle retention and low metal extractables properties.In addition,these cartridges have high mechanical strength and are suitable for a wide variety of filtration processes.

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Application

  • Process: Wet Etch and Cleans

  • Installation Point: Point of Tool

  • Chemistry: Dilute acids (such as BOE/DHF/SC2); Dilute bases (such as SC1/TMAH); DIW



Feature

  • Very high flow rates and longer life.

  • Low extractables.

  • Reduces equipment pre-operation time.

  • Excellent retention;

  • Manufactured in a cleanroom environment.

  • 100% integrity tested



  • Specification
  • Performance
  • Ordering Information


Product Specification

Membrane    High asymmetric polyethersulfone   

Supports/Cage/Core/End Caps Polypropylene (PP)

O-ringTEV or EPDM

Shell(Compact Capsule)Polypropylene (PP)

Shell(Disposable )PFA

Filter AreasX1 (Φ68mm):0.8m2/10"   Z1(Φ83mm):1.4m2/10"

Max. Operating Temperature90°C (194°F)

Max. Operating Pressure 0.49 MPa (4.9 bar, 71.07psi) @ 25°C (77°F)
0.34 MPa (3.4 bar, 49.31psi) @ 70°C (158°F)


    





Ordering Information


Cartridge

NVCZ11TOC2345


Block 1Block 2Block 3Block 4Block 5

Removal Ratings 

Nominal Length  

O-ring Material

Cleanliness   

Package 

NM10=10nm10E=10"P=TEVM=<25 μg/device     5/10/20/30/50nm
D=Dry

NM20=20nm

20E=20"

E=EPDM

H=<40 μg/device              50nm/0.1um

W=Prewet, UPW

NM30=30nm

E= Electronic grade            50nm/0.1umWH=Prewet, UPW+1% H2O2
NM50=50nm





NVCX11TOC2345


Block 1Block 2Block 3Block 4Block 5

Removal Ratings 

Nominal Length  

O-ring Material

Cleanliness   

Package 

NM10=10nm10=10"P=TEVM=<25 μg/device     5/10/20/30/50nm
D=Dry

NM20=20nm

20=20"

E=EPDM

H=<40 μg/device              50nm/0.1μm

W=Prewet, UPW

NM30=30nm30=30"
E= Electronic grade            50nm/0.1μmWH=Prewet, UPW+1% H2O2
NM50=50nm



0010=0.1μm






Compact Capsule

NVC1234


Block 1
Block 2

Block 3Block 4

Removal Ratings 

Fitting Type

Inlet/Outlet  

O-ring Material

Cleanliness   

Package 

NM05=5nm

NM10=10nm

NM20=20nm

NM30=30nm

NM50=50nm

0010=0.1μm

BFL64-4    =CFL

BFL64-10  =CFL

BFL64-20  =CFL

FL64         =CFL

NPT42      =NPT

NPT742    =NPT

NPT942    =NPT

SW43       =SW

SW743     =SW

SW943     =SW

SW44       =SW

SW744     =SW

SW944     =SW

SW84       =SW

SW784     =SW

SW984     =SW

SW764     =SW

3/8"

3/8"

3/8"

3/8"

1/4"

1/4"

1/4"

1/4"

1/4"

1/4"

1/4"

1/4"

1/4"

1/2"

1/2"

1/2"

3/8"

1/4"

1/4"

1/4"

1/4"

1/8"

1/8"

1/8"

4mm

4mm

4mm

1/4"

1/4"

1/4"

1/4"

1/4"

1/4"

1/4"


M=<25 μg/device     

        (5/10/20/30/50nm)

H=<40 μg/device              

       (50nm/0.1μm)

E= Electronic grade

      (50nm/0.1μm)

D=Dry

W=Prewet, UPW

WH=Prewet, UPW+1% H2O2



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